“Dolomite Puzzle Solved: How a Common Mineral Can Revolutionize Semiconductor Production”
Researchers from the University of Michigan and Hokkaido University in Sapporo, Japan have cracked a two-century-old geological mystery. Dolomite, a common mineral found in the Dolomite mountains in Italy, Niagara Falls, and Utah’s Hoodoos, has perplexed scientists for years due to its abundant presence in older rocks but being nearly absent in younger formations. Now, the team has not only unraveled this mystery but also discovered a revolutionary new method for semiconductor production.
To understand the significance of their discovery, it’s important to note that the growth edge of dolomite, when formed in water, consists of alternating rows of calcium and magnesium. This creates defects as calcium and magnesium atoms randomly attach to the growing dolomite crystal, preventing additional layers of dolomite from forming and slowing down its growth. Under normal conditions, it would take 10 million years to produce just one layer of ordered dolomite.
However, the researchers found that by periodically dissolving the defects in the mineral structure and encouraging the growth of defect-free dolomite, the process can be expedited. This breakthrough not only solves the long-standing “Dolomite Problem” but also presents a potential solution for creating new defect-free semiconductors.
Professor Wenhao Sun, the Dow Early Career Professor of Materials Science and Engineering at U-M and the corresponding author of the paper recently published in Science, emphasized the practical applications of this discovery.
“This theory shows that you can grow defect-free materials quickly, if you periodically dissolve the defects away during growth,” Sun stated.
The team was able to simulate dolomite growth using advanced techniques developed at U-M’s Predictive Structure Materials Science (PRISMS) Center, which allowed them to accurately calculate the atomic arrangements necessary for the growth of defect-free dolomite.
To validate their theory, the researchers tested it with transmission electron microscopes in collaboration with Professor Yuki Kimura from Hokkaido University. The results were astonishing, with the team growing approximately 100 nanometers of dolomite—around 250,000 times smaller than an inch—after repeated pulsing of the electron beam to dissolve away the defects. Such precision in creating dolomite layers has never been achieved before in a lab setting.
The implications of this discovery in the semiconductor industry are significant. The lessons learned from the Dolomite Problem can help engineers manufacture higher-quality materials for semiconductors, solar panels, batteries, and other tech. This new technique presents a paradigm shift, offering the potential to make functional materials more quickly and efficiently than ever before.
The research, which was published in the journal Science, was funded by the American Chemical Society PRF New Doctoral Investigator grant, the U.S. Department of Energy, and the Japanese Society for the Promotion of Science.